本文介绍了基于混合物理化学气相沉积法(HPCVD),以B2H6为硼源,在(000l)取向的Al2O3单晶衬底上,制备了MgB2超导体厚膜样品.该样品平均厚度约为40μm.其Tc(onset)=39K,Tc(0)=37.2K.X光衍射图显示该膜沿(101)方向生长,具有少量Mg和MgO杂相.SEM图像、X射线能量损失谱以及背散射电子衍射图证实了这两种杂相的存在,并显示该样品成分富镁.样品表面的镁与空气接触形成MgO膜,在一定程度上阻止了MgB2样品进一步被氧化.对于MgB2厚膜成膜过程及反应机理,我们提出了一种新的推断.
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