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介绍了自主开发的基于输运理论和蒙特卡罗方法的计算离子注入射程分布的软件集成系统JTU-PRII(JiaotongUniversity-ProjectRangeIonImplantation)，该系统整体上具有通用性、高效性和实用性。通用性即：该系统具有注入离子参数库和注入零件材料库的生成和调用功能，能计算各种注入条件下，包括各种注入离子，各种成分和形状的靶材，不同注入能量、注入剂量和注入角度时注入离子在靶材中的分布；高效性即：由于在关键步骤中用数值拟合公式代替了数值迭代求解，用固定飞行路程代替随机路程，使计算效率大大提高，计算速度大大加快；实用性即：由于考虑了溅射效应和靶材成分在注入过程中的动态变化，加之蒙特卡罗方法的固有特性，使计算的前提假设更接近实际，计算结果更加准确。与其它著名的同类软件，如TRIM和SASAMAL相比，该软件系统界面美观，操作便捷，能动态显示中间计算结果和注入过程曲线的变化，可调用、计算、比较、注释、拷贝和打印各条成分分布曲线，计算结果与实验结果吻合得也很好。

In this paper, the integrated software system named JTU-PRII(Jiaotong University-Project Range of Ion Implantation), which is based on the transport theory and Monte Carlo method and is develped by ourselves for range distribution of ion implantation, is introduced. The system generally possesses versatility、 efficiency and practicality. As for versatility, the system can build and utilize the parameter bank of various ions and material bank of various parts, can caculate the range distributions of implanted ions in the target for various conditions, such as for different incident ions, for different compositions and shapes of targets, for different energies、 doses and angles of incidence; As for efficiency, the computations are accelerated greatly by using some numerical simulating formulae instead of numerical iterative solution in key procedure and using fixed fly path instead of random fly path； As for practicality, the preassumptions of the simulation are closer to the reality and the simulating results are more accurate because the sputtering and the dynamic changes of targetic composition during penetration are considered and the advanced Monte Carlo method is used. Compared to other similar softwares, such as famous TRIM and SASAMAL, it is more beautiful for surface, more convenient for operaion, it can call, compute, compare, commnt, copy and print all curves needed, and the simulating results consist with the experiments very well