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将Ti-Al粉末冶金靶用多弧离子镀技术制备了TiAlN/Ti涂层.用XTEM等手段研究了涂层的界面结构.研究表明,TiAlN及Ti层均呈柱状多晶组织,在Ti过渡层与高速钢基底之间存在界面相FeTi,它与基底中的α-Fe相具有一定的取向关系.

参考文献

[1] 王永康,夏立芳,雷廷权,熊仁章,白羽.TiAlN/Ti多元复合涂层的截面透射电镜研究[J].兵器材料科学与工程,2000(06):12-15.
[2] Sant S B;Gill K S .Growth and characterization of cathodic arc evaporated CrN,(Ti,Al) N and (Ti,Zr ) N films[J].Surface and Coatings Technology,1994,68-69:152-156.
[3] Palmers J;Stappen M V .Deposition of (Ti,Al)N coatings by means of electron beam ion plating with evaporation of Ti and Al from two separate crucibles[J].Surface and Coatings Technology,1995,76-77:363-366.
[4] LUGSCHEIDER E;Knotek O .Deposition of arc TiAlN coating with pulsed bias[J].Surface and Coatings Technology,1995,76-77:700-705.
[5] Wang Y K;Xia L F;Lei T Q et al.A research on microstructure and properties of (Ti, Al) N coating[J].Surface and Coatings Technology,1995(72):71-75.
[6] Coll B F;Sathrum P et al.Optimization of arc evaporated (Ti,Al)N film composition for cutting tool applications[J].Surface and Coatings Technology,1992(52):57-64.
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