用高能量密度脉冲等离子体同轴枪分别在硬质合金和氮化硅陶瓷刀具基体上沉积了Ti(C,N)薄膜,研究了各种因素对薄膜相转化的影响,通过XRD分析,最后得到合适的Ti(C,N)薄膜沉积工艺条件是:枪压3.5kV,同轴枪与试样间距30～40mm,氮气进气压力0.2MPa,电磁阀电压1.5kV,脉冲等离子轰击次数5次以上.
参考文献
| [1] | Knotek O;Lffler F;Barimani C et al.Hard coatings for cutting and forming tools by PVD arc processes[J].Materials Science Forum,1997,246:29-60. |
| [2] | 彭志坚,齐龙浩,刘大鹏,李文治,苗赫濯.低温PVD法制备多组分超硬薄膜研究[J].材料科学与工程学报,2003(01):110-116. |
| [3] | 彭志坚,苗赫濯,齐龙浩,龚江宏,杨思泽,刘赤子.高能量密度脉冲等离子体制备高硬耐磨TiN涂层[J].金属学报,2003(06):561-564. |
| [4] | 彭志坚,苗赫濯,齐龙浩,龚江宏,杨思泽,刘赤子.高能量密度脉冲等离子体制备的氮化钛刀具涂层的微观结构与力学性能[J].科学通报,2003(09):900-904. |
| [5] | Zhijian Peng;Hezhuo Miao;Longhao Qi .Hard and wear-resistant titanium nitride coatings for cemented carbide cutting tools by pulsed high energy density plasma[J].Acta materialia,2003(11):3085-3094. |
| [6] | Peng ZJ.;Miao HZ.;Wang W.;Yang S.;Liu C.;Qi LH. .Hard and wear-resistant titanium nitride films for ceramic cutting tools by pulsed high energy density plasma[J].Surface & Coatings Technology,2003(2/3):183-188. |
| [7] | Yan Pengxun;Yan Si-Ze;Li Bin et al.A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma[J].Nuclear Instruments and Methods in Physics Research,1995,95:55-58. |
| [8] | 闫鹏勋;杨思泽;李兵 等.用高能量密度等离子体在室温下制备氮化钛薄膜[J].科学通报,1994,39(17):1547-1549. |
| [9] | 吴成.脉冲送气等离子体枪的实验[J].核聚变与等离子体物理,1989(03):178. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%