通过真空蒸镀方法在硅片和玻片上制备了TiNiPd合金薄膜,使用能谱仪、差示扫描量热法和X射线衍射等方法,研究了薄膜的成分及随退火温度上升的晶化和结构变化情况.结果表明:真空蒸镀薄膜成分偏离镀材成分,钛含量降低,钯、镍含量升高;真空蒸镀薄膜的晶化温度在600℃左右;B2相、B19相和B19′相是真空蒸镀薄膜在晶化处理后的主要组成相;450℃×5 h预处理促进B2相向B19′相转变.
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