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为改善NiTi形状记忆合金表面的生物相容性,采用辉光离子氮化的方法在其表面制备了氮化层,利用多种手段对其表面氮化层的显微组织结构以及表面性能进行了研究.结果表明:经过900℃辉光离子氮化后,不仅在NiTi形状记忆合金表面形成了致密、均匀的TiN层,而且在基体与TiN层之间还形成了均匀的Ti2Ni过渡层,且随着氮化时间的延长,膜层及过渡层的厚度都随之增加.生成的氮化层大大提高了NiTi形状记忆合金的耐腐蚀性能.

参考文献

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