本文采用热丝CVD法在以Cu/Re镀膜为过渡层的铁衬底上沉积金刚石薄膜,研究了以Re作为铁衬底上沉积金刚石膜的过渡层的制备工艺及其对沉积金刚石膜的影响.实验结果表明:在铁衬底上难以直接镀上铼膜,但在铜上镀铼比铁衬底上镀铼要容易得多,且镀铼层质量好.以Cu/Re复合膜为过渡层,以巴基管为成核剂可以在铁衬底上沉积出质量很好的金刚石膜.
参考文献
[1] | Matsumoto S;Sato Y;Kamo M.Vapor Deposition of Diamond Particles from Methane Jpn[J].Journal of Applied Physiology,1982(21):L183. |
[2] | 曹传宝.微波等离子体低温制备金刚石膜[J].功能材料,1994(06):570. |
[3] | Singh B;Mesker O R;Levine A W et al.Hollow Cathode Plasma Assisted Chemical Vapor Deposition of Diamond[J].Applied Physics Letters,1988,52(20):1658. |
[4] | Kuriara K;Sasaki K;Kawarda M et al.High Rate Synthesis of Diamond by DC Jet Chemical Vapor Deposition[J].Applied Physics Letters,1988,52(06):437. |
[5] | Chen H;Nielsen M L;Gold C J.Growth of Diamond Films on Stainless Steel[J].Thin Solid Films,1992(212):169. |
[6] | Ong T P;Cheng R P H .Properties of Diamond Composite Films Grown on Iron Surfaces[J].Applied Physics Letters,1991,58(04):358. |
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