常温下脉冲激光沉积氮化硼薄膜研究

人工晶体学报, 2002, 31(5): 436-439. doi: 10.3969/j.issn.1000-985X.2002.05.003

常温下脉冲激光沉积氮化硼薄膜研究

王金斌 ^1, , 张灿云 ^2, , 钟向丽 ^3, , 杨国伟 ^4,

1.湘潭大学材料与光电物理学院,湘潭,411105

2.湘潭大学材料与光电物理学院,湘潭,411105

3.湘潭大学材料与光电物理学院,湘潭,411105

4.湘潭大学材料与光电物理学院,湘潭,411105

基金项目: 湖南省教育厅科研项目(01C061) 国家自然科学基金(50072022)

关键词：脉冲激光沉积 , 室温 , 立方氮化硼 , 爆炸结构氮化硼

Study of Deposition of Boron Nitride Films by Pulsed-laser at Room Temperature

由于氮化硼特别是立方氮化硼(c-BN)的独特性质和广泛的应用前景,一直受到材料研究工作者的广泛关注.本研究利用脉冲激光在室温下沉积出立方氮化硼薄膜,傅立叶变换红外光谱和X射线衍射分析表明在所制备的氮化硼薄膜中,立方相的含量很高;同时,该研究还观察到了氮化硼的另一种高压相-爆炸结构氮化硼(Explosive-BN,E-BN).本研究同时还讨论了氮化硼薄膜生长的原理.

参考文献

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材料期刊网

常温下脉冲激光沉积氮化硼薄膜研究

Study of Deposition of Boron Nitride Films by Pulsed-laser at Room Temperature

参考文献