利用直流等离子体喷射化学气相沉积法制备掺氮的金刚石厚膜.本文研究了在甲烷/氩气/氢气中加入氮气对金刚石膜生长、形貌和质量的影响.反应气体的比例由质量流量计控制,在固定氢气(5000sccm)、氩气(3000sccm)、甲烷(100sccm)流量的情况下改变氮气的流量,即反应气体中氮原子和碳原子的变化比例(N/ C比)范围是从0.06到0.68.同时金刚石膜在固定的腔体压力(4kPa)和衬底温度(800℃)下生长.金刚石膜用扫描电镜(SEM)、拉曼谱和X射线衍射表征.结果表明,氮气在反应气体中的大量加入对直流等离子体喷射制备金刚石膜的形貌、生长速率、晶体取向、成核密度等有非常显著的影响.
参考文献
[1] | Asmussen J. .The effect of nitrogen on the growth, morphology, and crystalline quality of MPACVD diamond films[J].Diamond and Related Materials,1999(2 Mar):220-225. |
[2] | T.D. Corrigan;D.M. Gruen;A.R. Krauss .The effect of nitrogen addition to Ar/CH_4 plasmas on the growth, morphology and field emission of ultrananocrystalline diamond[J].Diamond and Related Materials,2002(1):43-48. |
[3] | J. Stiegler;A. Bergmaier;J. Michler;S. Laufer;G. Dollinger;E. Blank .The effect of nitrogen on low temperature growth of diamond films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(12):29-40. |
[4] | W. Ahmed;C. A. Rego;R. Cherry;A. Afzal;N. Ali;I. U. Hassan .CVD diamond: controlling structure and morphology[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2000(3):153-158. |
[5] | Vandevelde T;Nesladek M;Quaeyhaegens C;Stals L .Optical Emission Spectroscopy of the Plasma during CVD Diamond Growth with Nitrogen Addition[J].Thin Solid Films,1996,290-291:143-147. |
[6] | Vandevelde T.;Quaeyhaegens C.;Stals L.;Nesladek M. .OPTICAL EMISSION SPECTROSCOPY OF THE PLASMA DURING MICROWAVE CVD OF DIAMOND THIN FILMS WITH NITROGEN ADDITION AND RELATION TO THE THIN FILM MORPHOLOGY[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(0):154-158. |
[7] | Tsao Ming Hong;Sheng Hsiung Chen et al.Effect of Nitrogen on Diamond Growth using Unconventional Gas Mixtures[J].Thin Solid Films,1995,270:148-153. |
[8] | Z. Yu. U. Karlsson;A. Flodstrom .Influence of oxygen and nitrogen on the growth of hot-filament chemical vapor deposited diamond films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(1/2):74-82. |
[9] | STIEGLER J;Lang T;Nygard-Ferguson M;Von Kaenel Y,Blank E .Low Temperature Limits of Diamond Film Growth by Microwave Plasma-assisted CVD[J].Diamond and Related Materials,1996,5:226-230. |
[10] | Lu F.X. .Economical deposition of a large area of high quality diamond film by a high power DC arc plasma jet operating in a gas recycling mode[J].Diamond and Related Materials,2000(9-10Sep/Oct):1655-1659. |
[11] | G. F. Zhang;D. S. Geng;Z. J. Yang .High nitrogen amounts incorporated diamond films deposited by the addition of nitrogen in a hot-filament CVD system[J].Surface & Coatings Technology,1999(2/3):268-272. |
[12] | J.A. Smith;K.N. Rosser;H. Yagi .Diamond deposition in a DC-arc Jet CVD system: investigations of the effects of nitrogen addition[J].Diamond and Related Materials,2001(3-7):370-375. |
[13] | Sanchez-garrido O;Gomez-aleixandre C.Dielectric and Raman Spectroscopy of MWCVD Diamond Thin Films[J].Journal of Materials Science:Materials in Electronics,1996:297-303. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%