ZnO是一种新型的Ⅱ-Ⅵ族直接带隙化合物材料,是一种很有潜力的短波长光电器件材料.当ZnO薄膜具有良好的c轴取向和晶格结构时,可得到优良的光电性能比如紫外光受激发射.本实验用XRD和SEM研究了工艺条件如基片温度、氩氧比及退火工艺对ZnO薄膜结构特性的影响.结果表明在基片温度250℃、氩氧比为1∶4的条件下,可得到结晶质量良好的ZnO薄膜;通过退火可以使薄膜应力得到驰豫,降低缺陷浓度,改善薄膜的结构特性.本实验采用直流磁控溅射的方法,最终在(100)硅衬底基片上制备出了高c轴取向、晶粒尺寸约70nm的ZnO薄膜.
参考文献
| [1] | Tang ZK.;Yu P.;Kawasaki M.;Ohtomo A.;Koinuma H.;Segawa Y.;Wong GKL. .Room-temperature ultraviolet laser emission from self-assembled ZnO microcrystallite thin films[J].Applied physics letters,1998(25):3270-3272. |
| [2] | Bagnall DM;Chen YF;Zhu Z;Yao T;Koyama S;Shen MY;Goto T .Optically pumped lasing of ZnO at room temperature[J].Applied physics letters,1997(17):2230-2232. |
| [3] | Reynolds D C;Look D C;Jogai B .Optically Pumped Lasing of ZnO[J].Solid State communications,1966,99(12):873. |
| [4] | Bagnall DM.;Zhu Z.;Yao T.;Shen MY.;Goto T.;Chen YF. .High temperature excitonic stimulated emission from ZnO epitaxial layers[J].Applied physics letters,1998(8):1038-1040. |
| [5] | Cao H.;Ong HC.;Ho ST.;Dai JY.;Wu JY.;Chang RPH.;Zhao YG. .Ultraviolet lasing in resonators formed by scattering in semiconductor polycrystalline films[J].Applied physics letters,1998(25):3656-3658. |
| [6] | Zu P;Tang Z K;Wong G K L et al.Room-temperature Gain Spectra and Lasing in Microcrystallite ZnO Thin Films[J].Journal of Crystal Growth,1998,184-185:601. |
| [7] | Zu P.;Wong GKL.;Kawasaki M.;Ohtomo A.;Koinuma H.;Segawa Y.;Tang ZK. .ULTRAVIOLET SPONTANEOUS AND STIMULATED EMISSIONS FROM ZNO MICROCRYSTALLITE THIN FILMS AT ROOM TEMPERATURE[J].Solid State Communications,1997(8):459-463. |
| [8] | Srikant V.;Clarke DR. .On the optical band gap of zinc oxide[J].Journal of Applied Physics,1998(10):5447-5451. |
| [9] | King SL.;Boyd IW.;Gardeniers JGE. .PULSED-LASER DEPOSITED ZNO FOR DEVICE APPLICATIONS[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,1996(0):811-818. |
| [10] | Kawasaki M;Ohtomo A;Koinuma H et al.[J].Materials Science Forum,1998,264-268:1459. |
| [11] | Ellermer K;Kudella F;Mientus R et al.[J].Thin Solid Films,1994,247:15. |
| [12] | Jin B J;Bae S H;Lee S Y .[J].Materials Science and Engineering,B71:301. |
| [13] | Klug H P;Alexander L E.X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials[M].Published by John Wiley and.Sons,1974 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%