线形同轴耦合式微波等离子体CVD法制备金刚石薄膜

人工晶体学报, 2004, 33(3): 432-435. doi: 10.3969/j.issn.1000-985X.2004.03.037

线形同轴耦合式微波等离子体CVD法制备金刚石薄膜

杨志威 ^1, , 陈立民 ^2, , 耿春雷 ^3, , 唐伟忠 ^4, , 吕反修 ^5, , 苗晋琦 ^6, , 赵中琴 ^7,

1.北京科技大学材料科学与工程学院,北京,100083

2.北京科技大学材料科学与工程学院,北京,100083

3.北京科技大学材料科学与工程学院,北京,100083

4.北京科技大学材料科学与工程学院,北京,100083

5.北京科技大学材料科学与工程学院,北京,100083

6.北京科技大学材料科学与工程学院,北京,100083

7.北京科技大学材料科学与工程学院,北京,100083

关键词：线形同轴耦合 , 微波等离子体 , CVD , 金刚石薄膜

Diamond Coatings Deposition Using the Linearly Coaxially Coupled Microwave Plasma CVD Device

线形同轴耦合式微波等离子体CVD装置是一种利用微波天线产生轴向分布的等离子体柱的新型微波等离子体CVD装置.由于它产生的等离子体是沿微波天线分布的,因而可避免石英管式、石英钟罩式以及不锈钢谐振腔式微波等离子体CVD装置中等离子体的分布容易受到金属工件位置干扰的缺点.本文将首先讨论线形同轴耦合式微波等离子体CVD装置的工作原理,其后介绍利用此装置进行的金刚石薄膜沉积实验的初步结果.实验结果表明,利用线形同轴耦合式微波等离子体CVD装置,可在金属衬底上沉积出质量较好的金刚石薄膜.

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线形同轴耦合式微波等离子体CVD法制备金刚石薄膜

Diamond Coatings Deposition Using the Linearly Coaxially Coupled Microwave Plasma CVD Device

参考文献