不同工艺条件下在钼衬底(φ60mm)上用100 kW直流电弧等离子体喷射化学气相沉积设备进行金刚石膜的制备.金刚石膜用扫描电镜(SEM)、拉曼谱(激光激发波长为488nm)和X射线衍射来表征.研究结果表明,在直流电弧等离子体喷射化学气相沉积金刚石膜的过程中,内应力大小从金刚石膜的中央到边缘是增加的,并且应力形式是压应力.这说明了在金刚石膜中存在明显的应力不均.甲烷浓度和衬底温度都影响金刚石膜中的内应力.随着甲烷浓度和衬底温度的提高,金刚石膜中的内应力呈增加的趋势.
Diamond films were deposited on molybdenum substrates (φ60mm) by a 100kW DC arc plasma jet CVD apparatus under different process parameters. The diamond films were characterized by scanning electron microscopy (SEM), Raman spectroscopy (laser excitation wavelength:488 nm) and X-ray diffraction. The results show that in the process of DC arc plasma jet CVD diamond film deposition, the internal stress increases from the center to the edge, and the stress mode is compressive. This demonstrates a significant inhomogeneity of stress in diamond films. Both methane concentration and substrate temperature influence the internal stress in diamond films. The trend is that internal stress increases with the increase of methane concentration and substrate temperature.
参考文献
| [1] | Ferreira N G;Abramof E;Corat E J;Leite N F, Trava-Airoldi V J .Stress Study of HFCVD Boron-doped Diamond Films by X-ray Diffraction Measurements[J].Diamond and Related Materials,2001,10:50-754. |
| [2] | Kuo C T;Lin C R;Lien H M .Origins of the Residual Stress in CVD Diamond Films[J].THIN SOLID FILMS,1996,254:90-291. |
| [3] | Von Daenel Y;Stieger J;Michler J .Interfacial Structure,Residual Stress and Adhesion of Diamond Coatings Deposited by Different Deposition Methods[J].Applied Physical,1997,81(04):729. |
| [4] | Kuo CT.;Lin CH.;Lu TR.;Sung CM.;Wu JY. .Internal stresses and microstructures of commercial thick diamond films deposited by different deposition methods[J].Materials Chemistry and Physics,2001(2):114-120. |
| [5] | Kim J G;Jin Yu .[J].Materials Science and Engineering,1998,B57:4-27. |
| [6] | Qi Hua Fan;Gracio J;Pereira E .Behavior of Residual Stress on CVD Diamond Films[J].Diamond and Related Materials,2000,9:793-1743. |
| [7] | Ager J W;Drory M D .Residual Stresses in Chemical Vapour Deposited Diamond Films[J].Physical Review,1993,B48:601. |
| [8] | Lu F X;Tand W Z;Huang T B et al.Large Area High Quality Diamond Film Deposition by High Power DC Arc Plasma Jet Operating at Gas Recycling Mode[J].Diamond and Related Materials,2001,10:551-1558. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%