本文研究了750℃高温氨刻蚀对硅基铁纳米薄膜显微形态变化的影响.找到了纳米铁颗粒平均直径和平均分布密度随刻蚀时间、薄膜厚度等参数变化的规律,并对氨在其变化过程中的作用机制进行了初步探讨.研究发现: 5～10nm的薄膜原始厚度和8～12min的刻蚀时间是硅基铁纳米薄膜催化高定向碳纳米管阵列化学气相沉积生长的较理想条件.
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