本文采用水热法,在ZnO中添加In2O3为前驱物,3mol/L KOH作矿化剂,温度430℃,填充度35%,反应24h,制备了掺In的ZnO晶体.未掺杂In2O3合成的纯ZnO晶体呈六棱锥状,显露负极面-c{0001}、六棱锥面+p{1011}和-p{1011},一般不显露{0001}面.前驱物中掺杂In2O3所合成的ZnO晶体呈六角片状,直径约为5～20 μm,大面积显露{0001}面,另外还显露正锥面+p{1011}、负锥面-p{1011}和负极面-c{0001}.由此可见In掺杂可以明显的改变晶体的形态,使c轴极性快速生长趋向得到明显改善,有利于降低晶体生长缺陷.当采用ZnO晶片为籽晶时,通过水热反应在晶片上生长了一层掺In的ZnO薄膜,通过Hall参数测量得到晶体膜层的电子迁移率约为22cm2/(V·s),载流子浓度约为2×1020 cm-3,具有良好的导电性,同时也说明In可以微量掺入氧化锌晶体.
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