研究了多弧离子镀制备Ti-N膜的重要工艺参数(磁场、弧电流、偏压和氮气流量)对膜层质量的影响，详细分析了它们影响膜层特性的原因。实验证明，提高弧电流的同时抑制液滴的产生，是提高膜层质量和生产效率的有效途径。
The effects of the essential process parameters including magnetic field, arc current, bias and nitrogen flow on the quality of Ti-N film were investigated, and the mechanism affecting the filmcharacteristics was discussed. The experiment showed that the increase of arc current and reduction droplets could be an effective way for improving the quality and raising the productivity.
参考文献
| [1] | SnaperA A .[P].US 3 625 848,1971. |
| [2] | [P].US pat 3 836 451,1974. |
| [3] | Randhawa H;Johnson PC.Technical Note:A Review of Cathodic Arc Plasma Deposition Processes and Their Applications[J].Surface and Coatings Technology,1987(31):303. |
| [4] | Akari K;Perry AJ.Advances in cathodic arc technology using electrons extracted from the vacuum arc[J].Surface and Coatings Technology,1993(61):305. |
| [5] | Daalder D.Components of cathode erosion in vacuum arcs[J].Journal of Applied Physiology,1976(09):2379. |
| [6] | Nishbori M.How to solve problems of films coated by Arc methods[J].Surface and Coatings Technology,1992(52):229. |
| [7] | Lafferty J M.Vavuum Arcs Theory and Application Wiley[M].New York:John Wielg & Sons Inc,1980 |
| [8] | Tuma D T;Chen C L;Davies D K.Erosion products from the cathode spot region of a copper vacuum arc[J].Journal of Applied Physics,1978(49):3821. |
| [9] | Logathetidis S;Alexandrou I;Kokkou S.Optimization of TiN thin film growth with in situ monitoring: the effect of bias voltage and nitrogen flow rate[J].Surface and Coatings Technology,1996(80):66-71. |
| [10] | PetrivI;HuItman L;Sudgreu J E.Polyerystalline TiN films deposited by reative bias magnetron sputtering: Effects of ion bombardment of resputtering rates, film composition, and microstructure[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1992(10):265. |
| [11] | 徐新乐.枪黑色氮钛膜层性能的研究[J].材料保护,1996(06) |
| [12] | Koutev J;Pascova R;Weimantel E.Arc evaporated Ti-N films with reduced microparticle contamination[J].THIN SOLID FILMS,1996(287):202-207. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%