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用X射线衍射仪和透射电镜研究了化学镀Ni-P合金镀层的微观结构,提出了镀层结构模型, 分析了镀层生成的结晶机理,比较了化学镀低磷与高磷Ni-P合金的晶体结构区别 :前者为致密的镍基相中弥散分布粒状Ni3P相的晶体结构,后者为几何形状不规则的非晶 态结构。对非晶态组织在300 ℃和400 ℃进行热处理,合金镀层发生晶化转变,且生成的Ni 3P微晶显示出调幅结构。

Cailiao baohu 2001,34(2),10∽ 12(Ch). The microstructure of electroless plated Ni-P alloy deposit (heat treated at 200 ℃ ,300 ℃ ,400 ℃ )was studied by XRD and TEM. Comparisons were made on the structures of low and high phosphor contained Ni-P alloys, the former was in crystalline nickel phase with dispersed Ni3P and the later was in irregular amorphous structure. A microstructural model of the deposit was suggested.

参考文献

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[2] 胡信国.化学镀镍新技术及其在工业中的应用[J].电镀与精饰,1998(02):30.
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[5] Lee Sheng-long;Liang Han-His.The Structure and Hardness of Ele ctroless Ni-Mo-P Alloy Deposits[J].Plating and Surface Finishing,1992(02):56-59.
[6] 周上祺.X射线衍射分析[M].重庆:重庆大学出版社,1991
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