用网状阴极法在碳钢表面沉积氮化钽薄膜

材料保护, 2002, 35(5): 27-29. doi: 10.3969/j.issn.1001-1560.2002.05.010

用网状阴极法在碳钢表面沉积氮化钽薄膜

窦瑞芬 ^1, , 田林海 ^2, , 潘俊德 ^3, , 陈飞 ^4, , 赵晋香 ^5,

1.太原理工大学表面工程研究所,山西,太原,030024

2.太原理工大学表面工程研究所,山西,太原,030024;西安交通大学材料工程学院,陕西,西安,710074

3.太原理工大学表面工程研究所,山西,太原,030024

4.太原理工大学表面工程研究所,山西,太原,030024

5.太原理工大学表面工程研究所,山西,太原,030024

基金项目: 山西省青年基金(991020)

关键词：网状阴极溅射 , 空心阴极效应 , 氮化钽薄膜

Depositing TaN Film on Carbon Steel Substrate by Net-Shape Cathode Sputtering Method

介绍了一种新型的在钢铁基体上制备氮化钽薄膜的方法 --网状阴极法.其设备简单、价格低廉.实验中发现,在各个参数配比合适的条件下,可制备出结构为fcc(面心立方)和hex(密排六方)的氮化钽薄膜.薄膜较致密且均匀,与基体的结合好 .同时分析了在最佳工艺参数条件下合成氮化钽膜的成分、组织、表面、断口形貌和结合力等.该方法为氮化钽薄膜作为结构材料使用提供了一种新的途径.

参考文献

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用网状阴极法在碳钢表面沉积氮化钽薄膜

Depositing TaN Film on Carbon Steel Substrate by Net-Shape Cathode Sputtering Method

参考文献