采用低温离子渗氮后再熔盐阳极化的方法,在钽表面形成厚度达微米数量级的非晶态层,测试了非晶层的成分、相结构和性能.结果表明,该非晶层相对于直接阳极化层,组织致密、硬度高、粗糙度低、电阻高.
参考文献
[1] | Sisco F T;Edward E.Columbium and Tantalum[M].New York: John Wiley and Sons Inc,1963 |
[2] | Yang L;Yong T M .Anodic oxide growth on tantalum with AC+DC fields[J].Journal of the Electrochemical Society,1995,142(10):3479-3485. |
[3] | Albella J M .Theoretical Approach for the constant voltage stage in anodic oxidation[J].Journal of the Electrochemical Society,1986,133(05):876-879. |
[4] | Montero I .Pore formation during the breakdown process in anodic Ta2O5 films[J].Electrochimica Acta,1987,32(01):171-174. |
[5] | KALRA K C.Anodic oxidation of tantalum in aqueous electrolytes[J].THIN SOLID FILMS,1989(177):35-47. |
[6] | Shimizu K .Direct observation of the two-layer structure of anodic oxide films on tantalum[J].Philosophical Magazine A:Physics of Condensed Matter:Structure,Defects and Mechanical Properties,1989,60(06):591-596. |
[7] | Shinizu K;Brown G M;Abazaki H H .Direct observation of anodic films formed on tantalum in concentrated phosphoric and sulphuric acid solutions[J].Corrosion Science,1998,40(06):963-973. |
[8] | ZHANG De-yuan,LU De-ping,LI Fang,CAI Li,Xu Lan-ping,LIN Qin.Kinetic mechanism of anodic oxidation of tantalum in nitrate melts[J].中国有色金属学会会刊,2000(05):695. |
[9] | Nigam R K;Chaudhary R S.Current efficiency Annealing Dielectric losses · resistivity of anodic oxide films tantalum formed in molten salt electrolyte (LiNO3+NaNO3+KNO3) at elevated temperatures[J].Indian Journal of Chemistry,1973(11):356-359. |
[10] | 张德元,曾卫军,付青峰,李放,林勤,罗文.钽表面离子渗氮工艺研究[J].材料热处理学报,2001(02):48-50. |
[11] | 黄云辉;袁洁;张振洲 .钽的熔盐阳极化工艺研究[J].表面技术,1995,24(01):17-19. |
[12] | 王一禾;杨膺善.非晶态合金[M].北京:冶金工业出版社,1989 |
[13] | Masaiti R L.X-ray characterization of oxidized tantalum nitride[A].Arisona USA:Phoenix,1991 |
[14] | Eckertova L.薄膜物理学[M].北京:科学出版社,1986 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%