利用电弧离子镀设备,沉积了不同C、N比的Ti(CxN1-x)薄膜,研究了C含量对Ti(CxN1-x)薄膜的结构(相结构、择优取向及晶格常数)及力学性能(硬度、膜基结合强度及抗磨损性能)的影响.结果表明,复合镀层的C、N比随CH4、H2流量之比而变化,但原子百分数之和基本不变(约46.5%).复合镀层结构致密,与基体结合良好,抗磨和切削性能优于TiC和TiN镀层.
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