拟通过化学腐蚀方法在铜基底上制备出高性能的不粘薄膜.具体为首先将分析纯HCl、HNO3、HF按体积比15:5:1混合,配制成腐蚀液对铜片进行腐蚀,构建出具有类荷叶表面的微/纳米结构,接着用按体积比1%配制好的氟硅烷溶液对该基片进行修饰,经风干后就制备出了具有超疏性能的不粘薄膜.试验中用接触角测量仪测得改性前清洁的铜基片对水、蓖麻油和丁羟胶的接触角分别为80°,25°和50°;相比而言,改性后的铜片对以上液滴的接触角分别为153°,137°和142°,用CB方程计算出改性后铜片表面细微结构中与液滴接触的空气膜所占的比例约为0.93.试验证明,不粘薄膜的超疏性能的实现是由微/纳米精细结构和低表面能的氟硅烷薄膜共同决定的.
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