为促进金属粒子在膜孔中生成,采用膜相渗透和化学镀结合的方法,研究了化学镀NiCo/PTFE磁性复合膜的工艺.在正交试验结果基础上探讨了主盐离子浓度比、NaOH浓度、N2H4浓度、反应温度和反应时间对NiCo/PTFE复合膜中金属含量和磁性能的影响.本工艺最佳配方为:0.14 mol/L CoCl2·6H2O,0.06 mol/L NiCl2·6H2O,0.90 mol/L NaOH,0.45 mol/L C4H4O6KNa·4H2O,0.45 mol/L N2H4·H2O;最佳参数为:70～75℃,75 min.结果表明,相对于传统的双面金属化处理,引入膜相渗透的单面活化有助于镍钴金属粒子在膜孔内原位生成.
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