利用正交试验对MB2镁合金无铬、磷、镁微弧氧化成膜工艺进行了研究,同时利用表面分析技术,分析了氧化膜层的显微硬度、截面形貌和相结构,采用动电位扫描法考察了氧化膜的耐腐蚀性能.研究的最佳工艺条件为:30 g/L KOH,45g/L Al(OH)3,2 g/L K2SiO3,2g/L添加剂M,电流密度65 mA/cm2,温度45℃.该微弧氧化新工艺能在镁合金上形成银灰色的氧化膜层,其显微硬度值及耐腐蚀性远优于传统含铬工艺DOW17所形成的膜层;微弧氧化膜主要由MgO,MgAl2O4,Al2O3组成,具有多孔结构,孔径较为均匀,分为内外两层,外层为疏松层,内层为与基体结合牢固的致密层;在成膜过程中,电解液的铝盐浓度和微弧氧化电流密度是影响性能的主要因素.
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