采用脉冲喷射电沉积方法制备了纳米晶镍镀层,用扫描电子显微镜(SEM)、透射电子显微镜(TEM)和X射线衍射(XRD)等方法研究了镀层的生长形貌和微观结构,并考察了脉冲电流密度对镀层微观结构如晶粒尺寸、织构等的影响.结果表明:镀层内表面(基体一侧)具有比外表面(镀液一侧)更为精细的晶粒结构,说明随着厚度的增加,镀层中的晶粒逐渐粗化.随着电流密度从45 A/dm2增加到180 A/dm2,镀层中晶粒生长的择优取向由(111)织构逐渐转变为强(220)织构.当电流密度从45 A/dm2增加到120 A/dm2时,镀层平均晶粒尺寸逐渐减小;而进一步增加电流密度到180 A/dm2,镀层晶粒尺寸又会有轻微的增大.
参考文献
| [1] | 卢柯;周飞 .纳米晶体材料的研究现状[J].金属学报,1997,33(01):99-106. |
| [2] | 徐承坤,杨中东.电沉积法制备纳米晶材料[J].金属功能材料,1997(03):102. |
| [3] | 邓姝皓,龚竹青,陈文汩.电沉积纳米晶体材料的研究现状与发展[J].电镀与涂饰,2001(04):35-39,50. |
| [4] | El Shefik A M;Erb U .Synthesis of bulk nanocrystalline nickel by pulsed electrodeposition[J].Journal of Materials Science,1995,30:5743-5749. |
| [5] | Tang PT.;Andersen JET.;Bechnielsen G.;Watanabe T. .IMPROVED CORROSION RESISTANCE OF PULSE PLATED NICKEL THROUGH CRYSTALLISATION CONTROL[J].Journal of Applied Electrochemistry,1995(4):347-352. |
| [6] | Karakus C;Chin D T .Metal distribution in jet plying[J].Journal of the Electrochemical Society,1994,141(03):691-697. |
| [7] | Choo R T C;Toguri J M;El Sherik A M et al.Mass transfer and electrocrystallization analyses of nanocrystalline nickel production by pulse plming[J].Appl Electrochem,1995,25:384-403. |
| [8] | El Shefik A M;Erb U;Page J .Microstmctural evolution in pulse plated nickel electrodeposits[J].Surface and Coatings Technology,1996,88:70-78. |
| [9] | Cziraki A;Fogarassy B;Gerocs l et al.Microstructure and growth of electrodeposited nanocrystalline nickel foils[J].Journal of Materials Science,1994,29:4771-4777. |
| [10] | 江山,潘勇,唐甜,周益春.喷射电沉积纳米晶镍镀层的制备与表征[J].湘潭大学自然科学学报,2004(03):61-65. |
| [11] | 黄子勋;吴纯素.电镀理论[M].北京:中国农业机械出版社,1982:27-82. |
| [12] | 李铭华;袁诗璞.高速电镀[M].成都:四川人民出版社,1980:52-53. |
| [13] | Kollia C;Spyrellis N;Amblard J et al.Nickel plating by pulse electrolysis:textural and microstructural modifications due to adsorption/desorption phenomena[J].Applied Electrochemistry,1990,20:1025-1032. |
| [14] | 张立德;牟季美.纳米材料与纳米结构[M].北京:科学出版社,2001:148-150. |
| [15] | Toth Kadar E;Bakonyi I;Pogany L et al.Microstructure and electrical transport properties of pulse-plated nanocrystalline nickel electrodeposits[J].Surface and Coatings Technology,1996,88:57-65. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%