采用XPS技术研究了Fe/SiO2核壳复合粒子的表面化学成分和电子结构.结果表明,表面化学成分仅由Si和O元素组成,表面Si存在4种电子结构,表面O存在5种电子结构.表面硅4种电子结构的Si2p电子结合能及归属为:102.91 eV (51.18%)为Q4硅[Si(OSi)4],102.15 eV (23.23%)为Q3硅[Si(OSi)3OH],103.98 eV (18.70%)为Q2硅[Si(OSi)2(OH)2],101.35 eV (6.89%)为Q1硅[Si(OSi)(OH)3];表面氧5种电子结构的O1s电子结合能及归属为:532.85 eV(52.07%)为Q4硅基团中的氧,531.80 eV(19.93%)为Q3硅基团中的氧,533.90 eV (17.09%)为Q2硅基团中的氧,534.75 eV (7.65%)为Q1硅基团中的氧,530.55 eV (3.26%)为与金属铁核相互作用的氧.531.80和530.55 eV的氧原子数(19.93%+3.26%=23.19%)与102.15 eV的硅原子数(23.23%)非常相近,这不仅表明与金属铁核相互作用的表面氧为Q3硅基团中的氧,而且说明表面氧与金属铁核相互作用后O1s电子结合能会因为Fe给电子能力较大而降低.
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