用射频磁控溅射在普通玻璃衬底上制备CdTe薄膜.采用XRD对制备出的薄膜进行分析研究;并讨论了溅射气压、溅射功率对薄膜结晶性的影响.进一步研究表明:溅射气压低时溅射功率对CdTe薄膜结晶性的影响程度比溅射气压高时要大;溅射功率低时溅射气压对CdTe薄膜结晶性的影响程度比溅射功率高时要小.并对造成上述结果的机理进行了初步的理论探讨.
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