采用真空等离子沉积的类金刚石膜,它属于一种超薄性的薄膜.在诸多的测量方法中,本文采用了椭圆偏振光测量法来测量薄膜的厚度.该方法运用布鲁斯特角,并根据起偏器、检偏器和四分之一波片精确测量了薄膜的厚度.在测量薄膜厚度的同时也可知道所沉积膜的均匀性情况.
参考文献
| [1] | Masetti E .Thin film thickness measurement.A comparison of various techniques[J].Thin Solid Films,1985,124:249-257. |
| [2] | Pastore G F .Transmission interference spectrometric determination of the thickness and refractive idex of harrier films formed anodically on aluminium[J].Thin Solid Films,1984,114:9-17. |
| [3] | Rajora O S;Curzon A E .A simple method for the determi nation of film thickness from electron image contrast in a scanning electron microscope[J].Thin solid Films,1985,123:235-238. |
| [4] | Xu N;Zheng Z H .Growth of diamond films on Si3N4 coat ed silicon substrate[J].Materials Science and Technology,1996,121:1-6. |
| [5] | Pascual R et al.Thin film thickness measurement using the energy-dipersive spectroscopy technique in a scanning electron microscope[J].Thin Solid Films,1990,185:279-286. |
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