反应溅射TiO/AlO和TiN/AlN薄膜的微结构与力学性能

表面技术 , 2005, 34(5): 19-21. doi: 10.3969/j.issn.1001-3660.2005.05.006

反应溅射TiO/AlO和TiN/AlN薄膜的微结构与力学性能

赵文济 ^1, , 李一睿 ^2, , 胡祖光 ^3, , 许辉 ^4, , 祝新发 ^5, , 李戈扬 ^6,

1.上海交通大学金属基复合材料国家重点实验室,上海,200030

2.上海交通大学金属基复合材料国家重点实验室,上海,200030

3.上海工具厂有限公司,上海,200093

4.上海工具厂有限公司,上海,200093

5.上海工具厂有限公司,上海,200093

6.上海交通大学金属基复合材料国家重点实验室,上海,200030

基金项目: 上海市科技发展基金(037252052)

关键词： TiO薄膜 , AlO薄膜 , TiN薄膜 , AlN薄膜 , 反应溅射 , 微结构 , 力学性能

Microstructure and Mechanical Property of TiO/AlO and TiN/AlN Films Synthesized by Reactive Sputtering

采用Ti-Al镶嵌复合靶在Ar、N2和O2混合气体中反应溅射制备了一系列TiO/AlO和TiN/AlN薄膜,并采用EDS、XRD、TEM、AFM、SEM和微力学探针研究了薄膜的化学成分、微结构和力学性能.结果表明,随氧分压的提高,TiO/AlO和TiN/AlN薄膜中的氧含量逐步增加,氮含量相应减少,但其(Ti+Al):(O+N)仍保持约为1:1的化学计量比.薄膜保持与(Ti,Al)N薄膜相同的NaCl结构,并形成强烈(200)织构的柱状晶.与此同时,TiO/AlO和TiN/AlN薄膜的硬度和弹性模量也仍保持在与TiN/AlN薄膜相当的35GPa和370～420GPa的高值.由于薄膜中形成了相当含量的氧化物,这类薄膜的抗氧化能力有望得到提高.

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