介绍了类金刚石膜的性能、制备方法以及应用.类金刚石膜(DLC)是由sp3键组态的碳和sp2键组态的碳混合组成的碳材料,由于具有与金刚石膜(DF)相似的性能--优异的光学特性、机械特性、电学特性和化学特性,同时现行制备方法(化学气相沉积,物理气相沉积等)相对容易实现,并且其产品已经应用到光学、医学、机械、电子等多个领域,因此引起人们极大兴趣.
参考文献
| [1] | 朱纪军;左敦稳;王珉 .过滤式阴极电弧沉积类金刚石薄膜工艺研究[J].航空精密制造技术,1998,34(06):23-26. |
| [2] | wei Q;Narayan J .Super diamondlike carbon:preparation,theory,and properties[J].International Materials Reviews,2000,45(04):133-162. |
| [3] | V. N. Inkin;G. G. Kirpilenko;A. A. Dementjev;K. I. Maslakov .A superhard diamond-like carbon film[J].Diamond and Related Materials,2000(3-6):715-721. |
| [4] | GoGotsi Y;Welz S;Ersoy D et al.Conversion of silicon carbide to crystalline diamond-structured carbon at ambient pressure[J].Nature,2001,411:283-287. |
| [5] | 黄卫东 .表面波等离子体源合成类金刚石膜及其机理研究[D].中国科学技术大学,2001. |
| [6] | 梁风,严学俭.类金刚石薄膜的性质、应用及制备[J].物理学报,1999(06):1095-1102. |
| [7] | 袁镇海;邓其森;罗广南 等.类金刚石的制备、性能及应用[J].材料科学与工程,1994,48(12):32-38. |
| [8] | 满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002(01):62-70. |
| [9] | 戚学硅;陈则韶 .CVD金刚石膜的制备方法及其应用[J].支撑技术,2001,26(06):55-59. |
| [10] | AlanH Lettington.Applications of diamond-like carbon thin flims[M].Elsevier Science,1998(36):555-560. |
| [11] | Y. Lifshitz .Diamond-like carbon -- present status[J].Diamond and Related Materials,1999(8-9):1659-1676. |
| [12] | 蔡元霸,梁玉仓.纳米材料的概述、制备及其结构表征[J].结构化学,2001(06):425-438. |
| [13] | B. H. Lung;M. J . Chiang;M. H. Hon .Growth characterization and properties of diamond-like carbon films by electron cyclotron resonance chemical vapor deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(1):16-21. |
| [14] | J. C. Sanchez-Lopez;C. Donnet;J. Fontaine;M. Belin;A. Grill;V. Patel;C. Jahnes .Diamond-like carbon prepared by high density plasma[J].Diamond and Related Materials,2000(3-6):638-642. |
| [15] | Zhu Jijun;Zuo Dunwen;Wang Min.Study on diamond-like carbon thin film by filtered vacuum arc deposition[J].Transactions of Nanjing University of Aeronautics and Astronautics,1999(16):100-104. |
| [16] | Nobuki Mutsukura;Katsu-ichi Yoshida.Deposition of DLC films in CH4/Ar and CH4/Xe r f plasmas[J].diamond and Materials,1996(05):919-922. |
| [17] | 贾宏勇,林惠旺,陈培毅,钱佩信.采用高真空／快速热处理／化学气相淀积外延SiGe HBT结构[J].半导体学报,2001(03):251-255. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%