近年来,国内外SiC薄膜材料制备工艺研究迅速发展,由此带来SiC薄膜性能方面的研究也获得长足的进步,新技术、新工艺、新性能不断涌现.溅射SiC技术相对于其它沉积技术(CVD、PIP等)有许多独特的优点:沉积温度低、结合性和致密性好、表面平整、硬度高、光电性能优异以及工艺安全环保等,因此越来越受到重视,且已经成为沉积高性能SiC薄膜的重要技术方法.主要论述了几种不同溅射技术,着重介绍了溅射技术在SiC薄膜制备中的研究进展及SiC薄膜性能方面的研究进展和应用,并且展望了溅射技术制备SiC薄膜的发展前景和当前热点研究领域.
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