偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

表面技术 , 2008, 37(3): 22-24. doi: 10.3969/j.issn.1001-3660.2008.03.009

偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

杨娟 ^1, , 聂朝胤 ^2, , 陈志谦 ^3, , 谢红梅 ^4, , 文晓霞 ^5, , 卢春灿 ^6,

1.西南大学材料科学与工程学院,重庆,400715

2.西南大学材料科学与工程学院,重庆,400715

3.西南大学材料科学与工程学院,重庆,400715

4.西南大学材料科学与工程学院,重庆,400715

5.西南大学材料科学与工程学院,重庆,400715

6.西南大学材料科学与工程学院,重庆,400715

基金项目: 西南大学校科研和教改项目(SWNUF2005001;SWNUB2005001) 重庆市自然科学基金(2006BB4050)

关键词： CrNx薄膜 , 表面形貌 , 相结构 , 显微硬度 , 耐磨性 , 电弧离子镀 , 不锈钢 , 偏压

The Influences of Bias on the Microstructure and Mechanical Properties ofCrNx Films Prepared by Cathodic Arc Evaporation

采用电弧离子镀技术在不锈钢基体表面制备了CrNx薄膜,并采用场发射扫描电镜、X射线衍射仪、显微硬度仪、球-盘式摩擦磨损试验机等手段对在不同偏压下沉积的CrNx薄膜的表面形貌、相结构、显微硬度和摩擦学性能进行考察.结果表明:随着偏压的增加, CrNx薄膜沉积率下降,厚度降低,CrNx薄膜表面颗粒逐渐变少,表面粗糙度降低,结晶度增大,晶粒尺寸增加;CrNx薄膜由Cr2N相和CrN相组成,薄膜的择优取向发生较大变化.当偏压为-100V时,CrNx薄膜的表面结构最致密,硬度最高,抗磨损性能最强.

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偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

The Influences of Bias on the Microstructure and Mechanical Properties ofCrNx Films Prepared by Cathodic Arc Evaporation

参考文献