为了研究1种以甘氨酸为络合剂的三价铬镀铬工艺,采用正交试验法确定三价铬电沉积的最佳工艺,即0.6mol/L CrCl3*6H2O,0.6mol/L Gly,50g/L NH4Cl,0.6mol/L AlCl3·H2O,0.5mol/L NaCl,60g/L H3BO3,20g/L NaF,0.1mol/L KBr,适量的润湿剂和去极化剂,pH=1.8,Jk=15A/dm2,θ=20℃,时间15min.并具体讨论了络合比、阴极电流密度、时间、温度等因素对镀层厚度和外观的影响;试验结果证明:在该种工艺下可获得光亮、呈准镜面外观、厚度达8μm 左右的铬镀层;且经镀层性能检测表明:该镀层表面光亮、平整,与基体材料结合良好,具有一定的耐腐蚀性能.
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