为了进一步优化镀液成分和工艺参数,为制备W含量可在较大范围内变化的块状纳米晶Ni-W合金提供依据,采用不含任何氨根离子(NH-+4)的镀液通过电沉积方法制备纳米晶Ni-W合金镀层.采用XRD、SEM和EDS对镀层的结构、形貌和成分进行观察和分析.结果表明:电沉积过程中电流密度、电源类型、pH值及搅拌方式对镀层的W含量都会产生较大的影响.试验中所得到的Ni-W合金镀层的W含量为2.15%~30.31%(质量分数),其结构均为W溶于Ni晶格所形成的置换式固溶体,平均晶粒尺寸为14~19nm;随着镀层中W含量的增加,镀层的显微硬度也随之逐渐提高.
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