为了得到类金刚石薄膜的性质和制备参数之间的对应关系,利用射频等离子体增强化学气相淀积在单晶硅的(100)面上制备了类金刚石薄膜,反应气体是甲烷和氢气的混合气.研究了射频源的输入功率对类金刚石薄膜性能的影响.采用Raman光谱、X射线光电子能谱、原子力显微镜和纳米压痕仪对薄膜的微观结构、表面形貌、硬度和弹性模量进行了研究,结果表明:制备的薄膜具有典型的不定型碳的结构特征、薄膜致密均匀,随着入射功率的提高,薄膜的sp3含量、硬度以及弹性模量先增加后减小,并且在100W时达到最大值,在400W时薄膜出现碳化.
参考文献
| [1] | Suzuki J-I;Oknda S .Deposition of diamond-like carbon films using electron cyclotron resonance plasma chemical vapor deposition from ethylene gas[J].Japanese Journal of Applied Physics,1995,34:LI 218-LI 220. |
| [2] | Sawides N .Optical constants and associated functions of metastable diamondlike amorphous carbon films in the energy range 0.5-7.3eV[J].Journal of Applied Physics,1986,59:4 133-4 145. |
| [3] | Maitre N;Camelio S;Barranco A et al.Physical and chemical properties of amorphous hydrogenated carbon fdms deposited by PECVD in a low serf-bias range[J].Diamond and Related Materials,2003,12:988-992. |
| [4] | Yan PX;Wu XC .Study on the deposition of diamond-like carbon films in a low pressure cathode arc plasma[J].Materials Chemistry and Physics,1999(1):44-49. |
| [5] | Tajima N;Saze H;Sugimura H et al.Tribological properties of α-C:N and α-C films prepared by shielded arc ion plating[J].Vacuum,2000,59:567-573. |
| [6] | 张敏,程发良,姚海军.类金刚石膜的性质和制备及应用[J].表面技术,2006(02):4-6,9. |
| [7] | C. Mossner;P. Grant;H. Tran;G. Clarke;D. J. Lockwood;H. J. Labbe;B. Mason;I. Sproule .Characterization of diamond-like carbon by Raman spectroscopy, XPS and optical constants[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):397-401. |
| [8] | Zhang S;Zeng X T;Xie H et al.A phenomenological approach for the Id/ Ig ratio and sp3 fraction of magnetron sputtered α-C films[J].Surface and Coatings Technology,2000,123:256-260. |
| [9] | Choi WS;Heo J;Chung I;Hong B .The effect of RF power on tribological properties of the diamond-like carbon films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):287-290. |
| [10] | Okpalugo T I T;Maguire P D;Ogwu A A et al.The effect of silicon doping and thermal annealing on the electrical and structural properties of hydrogenated amorphous carbon thin films[J].Diamond and Related Materials,2004,13:1 549-1 552. |
| [11] | Anita V;Butuda T;Maeda T et al.Effect of N doping on properties of diamond-like cation thin films produced by RF capacitively coupled chemical vapor deposition from different precursors[J].Diamond and Related Materials,2004,13:1 993-1 996. |
| [12] | Kim YT.;Cho SM.;Choi WS.;Hong B.;Yoon DH. .Dependence of the bonding structure of DLC thin films on the deposition conditions of PECVD method[J].Surface & Coatings Technology,2003(0):291-294. |
| [13] | 常海波,徐洮,李红轩,张治军,刘惠文.用等离子体增强化学气相沉积技术制备类金刚石碳薄膜的摩擦磨损性能研究[J].摩擦学学报,2005(04):298-302. |
| [14] | Chowdhury S;Langier M T;Rahman I Z .Characterization of DLC coatings deposited by rf megnetron spattering[J].Journal of Materials Processing Technology,2004,153-154:804-810. |
| [15] | Becman D;Silverman J;Lynds R et al.Studies of amorphous carbon[J].Physical Review B,1984,30:870-875. |
| [16] | Cheng Y H;Wu Y P;Chen J G et al.On the deposition mechanism of α-C:H films by plasma enhanced chemical vapor deposition[J].Surface and Coatings Technology,2000,135:27-33. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%