为了提高单个靶件的铀装载量,简化制备工艺,将目前广泛用于制备α核素靶的电沉积方法用于铀靶的制备.研究了在水溶液体系中电沉积制备铀靶的方法,以0.15mol/L草酸铵为电沉积液,研究了不锈钢基层处理工艺、电流密度、酸度、温度、镀液中铀离子浓度等对电沉积层质量的影响,确定了电沉积法制备铀靶的工艺参数,运用扫描电子显微镜、X射线能谱和红外光谱对电沉积层的表面形貌、微区成分和结构组成进行分析和表征.控制镀液中UO2(NO2)2的量,调节镀液pH至2～3,电流密度60mA/cm2,通入60℃恒温水,保持(NH1)2C2O4的质量浓度在4～6mg/mL2,即可获得6mg/cm2的电沉积层,分光光度法测其电沉积效率>98%,厚度约6mg/cm2.
参考文献
| [1] | Burril K A;Harrison R J.Development of the 99Mo Process at CRNL.Fission Molybdenum for Medical Use[A].Karlsruhe,1989:23-33. |
| [2] | Aggarwal S;Shah P M;Duggal R K .Electrodeposition of Milligram Amounts of Uranium on Electropolished Stainless Steel Disks[J].Journal of Radioanalytical and Nuclear Chemistry,1991,154(02):103-110. |
| [3] | Vandergrift G F;Conner C;Bakel A.RERTR Progress in Mo-99 Production From LEU[A].Ghent,Belgium,2002:17-20. |
| [4] | 白静,吴晓蕾,林茂盛,范芳丽,丁华杰,雷富安,李小飞,秦芝,郭俊盛.单次分子镀法制备部分La系及238U靶的实验研究[J].原子核物理评论,2010(02):187-191. |
| [5] | 秦芝,郭俊盛,甘再国.分子镀法制备厚镅（241,243Am）靶[J].同位素,2000(04):209-214. |
| [6] | 杨春莉;苏树新;张生栋 .脉冲电镀与直流电镀制源技术研究进展[J].核化学与放射化学,2007,29(04):243. |
| [7] | 秦芝 .电沉积法制备233U同位索靶[J].核技术,1995,18(02):94-97. |
| [8] | Mirashi N N;Mathur J N;Prakash Satya .Studies on the Electrodeposition of Uranium on Aluminium[J].Applied Radiation and Isotopes,1986,37(04):358-359. |
| [9] | Kolodney M.Preparation of the First Electrotic Plutonium and of Uranium from Fused Chlorides[J].Journal of the Electrochemical Society,1982(129):2438-2441. |
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