采用直流磁控溅射方法在载玻片上制备钛钨合金热敏感薄膜,测试了所制备的钛钨合金热敏薄膜在不同温度下的方块电阻,并根据测试曲线计算薄膜的电阻温度系数(TCR).研究了工作气压、氩气流量以及溅射电流对钛钨合金膜TCR的影响,获得了最佳沉积工艺参数,即:溅射电流0.32 A,工作气压0.8 Pa,氢气流量60 cm3/min.在此参数下制备的钛钨合金膜TCR为0.2％/K.测试结果也表明钛钨合金膜的时间稳定性好.
参考文献
| [1] | LISICKA-SKRZEK E;COYNE W;MILLAR G et al.Effect of Nitridation on the Electrical Properties of W:Ti Resistors[J].Journal of Electronic Materials,1994,23:1067-1070. |
| [2] | HUNTER S R;MANTEA R A;OODMAN L A;t al .igh Sensitivity Uncooled Microcantilever Infrared Imaging Arrays[J].Proceedings of SPIE-The International Society for Optical Engineering,2003,5074:469-480. |
| [3] | HADZEL P;JURCZYSZYN L;KUCHARCZYK R .Structural and Electronic Properties of the Ti/W (111) Adsorption System[J].Surface Science,2009,603:2507-2519. |
| [4] | Petrovic S;Bundaleski N;Perusko D;Radovic M;Kovac J;Mitric M;Gakovic B;Rakocevic Z .Surface analysis of the nanostructured W-Ti thin film deposited on silicon[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(12):5196-5202. |
| [5] | GLEBOVSKY V G;MARKARYANTS E A;TITOV E V .Deposition of Ti-W Thin Films by Magnetron Cosputtering[J].Materials Letters,1994,21:89-93. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%