从电弧蒸发源控制技术和大颗粒过滤技术出发,论述了电弧离子镀技术最近的发展成果,并总结了电弧离子镀技术在氮化物、氧化物、非晶碳等薄膜方面的技术应用进展,以期能对我国电弧离子镀技术及其在硬质薄膜方面的应用起到一定的参考作用.
参考文献
[1] | WRIGHT A W .On the Production of Transparent Metallic Films by the Electrical Discharge in Exhausted Tubes[J].American Journal of Science and Arts,1877,13:49-55. |
[2] | EDISON T A .Process of Duplicating Phonograms[P].US,484582,1892-10-18. |
[3] | SABLEV L P;ATAMANSKY N P;GORBUNV V N et al.Apparatus for Metal Evaporation Coating[P].US,3793179,1974-03-19. |
[4] | SABLEV L P;DOLOTOV J I;GETMAN L I et al.Apparatus for Vacuum-Evaporation of Metals Under the Action of an Electric Arc[P].US,3783231,1974-01-01. |
[5] | BURKHARD J .Characterization of the Cathode Spot[J].IEEE Transactions on Plasma Sciences,1987,15(05):474-480. |
[6] | David M. Sanders;Andre Anders .Review of cathodic arc deposition technology at the start of the new millennium[J].Surface & Coatings Technology,2000(0):78-90. |
[7] | ROSEN JOHANNA;ANDERS ANDRE;MRAZ STANISLAV et al.Charge-state-resolved Ion Energy Distributions of Aluminum Vacuum Arcs in the Absence and Presence of a Magnetic Field[J].Journal of Applied Physics,2005,97:103306-103311. |
[8] | 赵时璐,李友,张钧,王闯,刘常升.刀具氮化物涂层的研究进展[J].金属热处理,2008(09):99-104. |
[9] | 余东海,王成勇,张凤林.刀具涂层材料研究进展[J].工具技术,2007(06):25-32. |
[10] | 王目孔,马瑞新,林炜,康勃,吴中亮.TiAlN硬质薄膜/涂层材料的研究进展[J].硬质合金,2008(03):186-191. |
[11] | PalDey S.;Deevi SC. .Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review [Review][J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2003(1/2):58-79. |
[12] | Juttner B. .THE DYNAMICS OF ARC CATHODE SPOTS IN VACUUM[J].Journal of Physics, D. Applied Physics: A Europhysics Journal,1995(3):516-522. |
[13] | SIEMROTH P;SCHULKE T;WOTKE T .High-current Arc-a New Source for High-rate Deposition[J].Surface and Coatings Technology,1994,68/69:314-319. |
[14] | T. Witke;T. Schuelke;B. Schultrich;P. Siemroth;J. Vetter .Comparison of filtered high-current pulsed arc deposition (Φ-HCA) with conventional vacuum arc methods[J].Surface & Coatings Technology,2000(1):81-88. |
[15] | Jochen M. Schneider;Andre Anders;Bjorgvin Hjorvarsson;Ivan Petrov;Karol Macak;Uif Helmersson;Jan-Eric Sundgren .Hydrogen uptake in alumina thin films synthesized from an aluminum plasma stream in an oxygen ambient[J].Applied physics letters,1999(2):200-202. |
[16] | Yushkov G.Y.;Anders A. .Effect of the pulse repetition rate on the composition and ion charge-state distribution of pulsed vacuum arcs[J].IEEE Transactions on Plasma Science,1998(2):220-226. |
[17] | AKSENOV I I;BELOUS V A;PADALKA V G et al.Transport of Plasma Streams in a Curvilinear Plasma-optics System[J].Soviet Journal of Plasma Physics,1978,4(04):425-428. |
[18] | AKSENOV I I;BELOUS V A;PADALKA V G et al.Apparatus to Rid the Plasma of a Vacuum Arc of Macroparticles[J].Instruments and Experimental Techniques,1978,21:1416-1418. |
[19] | P. J. Martin;A. Bendavid .Review of the filtered vacuum arc process and materials deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(1/2):1-15. |
[20] | Helmersson U;Lattemann M;Bohlmark J;Ehiasarian AP;Gudmundsson JT .Ionized physical vapor deposition (IPVD): A review of technology and applications[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):1-24. |
[21] | BRANDOLF HENRY E .Vapor Deposition Apparatus and Method[P].US,4511593,1985-04-16. |
[22] | A.l. Ryabchikov;l. B. Stepanov;S. V. Dektjarev .Vacuum arc ion and plasma source Raduga 5 for materials treatment[J].Review of Scientific Instruments,1998(1/2):893-895. |
[23] | Bilek Marcela M.M.;Brown Ian G.;Anders Andre .Characterization of a linear venetian-blind macroparticle filter for cathodic vacuum arcs[J].IEEE Transactions on Plasma Science,1999(4):1197-1202. |
[24] | Tay BK;Zhao ZW;Chua DHC .Review of metal oxide films deposited by filtered cathodic vacuum arc technique[J].Materials Science & Engineering, R. Reports: A Review Journal,2006(1/3):1-48. |
[25] | ANDERS ANDRE;ANDERS SIMONE;BROWN IAN G .Effect of Duct Bias on Transport of Vacuum Arc Plasmas through Curved Magnetic Filters[J].Journal of Applied Physics,1994,75:4900-4905. |
[26] | Bilek M.M.M.;McKenzie D.R. .Interactions of the directed plasma from a cathodic arc with electrodes and magnetic fields[J].IEEE Transactions on Plasma Science,1996(5):1291-1298. |
[27] | BILEK MARCELA M M;YIN YONGBAI;MCKENZIE DAVID R .Study of Filter Transport Mechanisms in Filtered Cathodic Vacuum Arcs[J].IEEE Transactions on Plasma Sciences,1996,24(03):1165-1173. |
[28] | Anders S.;Anders A. .S-shaped magnetic macroparticle filter for cathodic arc deposition[J].IEEE Transactions on Plasma Science,1997(4):670-674. |
[29] | GOROKHOVSKY VLADIMIR I;BHAT DEEPAK G;SHIVPURI RAJIV et al.Characterization of Large Area Filtered Arc Deposition Technology:Part Ⅱ-Coating Properties and Applications[J].Surface and Coatings Technology,2001,140(03):215-224. |
[30] | GOROKHOVSKY VLADIMIR I;BHATTACHARYAB RABI;BHAT DEEPAK G .Characterization of Large Area Filtered Arc Deposition Technology:Part Ⅰ-Plasma Processing Parameters[J].Surface and Coatings Technology,2001,140(02):82-92. |
[31] | ZHAO D C;XIAO G J;MA Z J et al.Study on Properties of Aluminum Film Deposited on GFRP by Cathodic Arc Technology[J].Physics Procedia,2011,18:240-244. |
[32] | XIAO J Q;LANG W C;GONG J et al.Effects of Axisymmetric Magnetic Field on the Distribution of Macroparticles on TiN and (Ti,Al)N Films by Arc Ion Plating[J].Physics Procedia,2011,18:193-201. |
[33] | Rodriguez RJ.;Garcia JA.;Medrano A.;Rico M.;Sanchez R.;Martinez R. Labrugere C.;Lahaye M.;Guette A. .Tribological behaviour of hard coatings deposited by arc-evaporation PVD[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(3/4):559-566. |
[34] | Lousa A;Esteve J;Mejia JP;Devia A .Influence of deposition pressure on the structural mechanical and decorative properties of TiN thin films deposited by cathodic arc evaporation[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2007(11/12):1507-1510. |
[35] | Mubarak, A;Hamzah, E;Toff, MRM .Study of macrodroplet and growth mechanisms with and without ion etchings on the properties of TiN coatings deposited on HSS using cathodic arc physical vapour deposition technique[J].Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing,2008(1/2):236-242. |
[36] | M. Ali;E. Hamzah;I.A. Qazi;M.R.M. Toff .Effect of cathodic arc PVD parameters on roughness of TiN coating on steel substrate[J].Current applied physics: the official journal of the Korean Physical Society,2010(2):471-474. |
[37] | Y. H. Cheng;T. Browne;B. Heckerman .Mechanical and tribological properties of CrN coatings deposited by large area filtered cathodic arc[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,2011(5/6):775-782. |
[38] | Arias DF;Arango YC;Devia A .Study of TiN and ZrN thin films grown by cathodic arc technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(4):1683-1690. |
[39] | Arias, D.;Devia, A.;Velez, J. .Study of TiN/ZrN/TiN/ZrN multilayers coatings grown by cathodic arc technique[J].Surface & Coatings Technology,2010(18/19):2999-3003. |
[40] | Barankova H;Bardos L;Gustavsson LE .High-rate hot hollow cathode arc deposition of chromium and chromium nitride films[J].Surface & Coatings Technology,2004(0):703-707. |
[41] | Zhao, Y.;Lin, G.;Xiao, J.;Dong, C.;Wen, L. .TiN/TiC multilayer films deposited by pulse biased arc ion plating[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2010(1):1-4. |
[42] | Cheng, Y.H.;Browne, T.;Heckerman, B.;Bowman, C.;Gorokhovsky, V.;Meletis, E.I. .Mechanical and tribological properties of TiN/Ti multilayer coating[J].Surface & Coatings Technology,2010(1):146-151. |
[43] | 曾鹏,彭神华,胡社军,谢光荣.AlCrN涂层刀具研究新进展[J].工具技术,2008(03):16-19. |
[44] | Jun Zhang;Wenying Guo;Yu Zhang;Qiang Guo;Chuang Wang;Lipeng Zhang .Mechanical properties and phase structure of (TiAlZr)N films deposited by multi arc ion plating[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(17):4830-4834. |
[45] | Kim SK;Vinh PV;Kim JH;Ngoc T .Deposition of superhard TiAlSiN thin films by cathodic arc plasma deposition[J].Surface & Coatings Technology,2005(5/6):1391-1394. |
[46] | Martin PJ.;Bendavid A. .The filtered arc process and materials deposition[J].Surface & Coatings Technology,2001(0):7-10. |
[47] | C.W.Zou .Structure and mechanical properties of Ti-Al-N coatings deposited by combined cathodic arc middle frequency magnetron sputtering[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,2011(5):1989-1993. |
[48] | Jun Zhang;Huimin Lv;Guanying Cui;Zhi Jing;Chuang Wang .Effects of bias voltage on the microstructure and mechanical properties of (Ti,Al,Cr)N hard films with N-gradient distributions[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2011(15):4818-4823. |
[49] | 赵栋才,任妮.降低超硬类金刚石薄膜应力的方法[J].真空与低温,2006(01):1-8. |
[50] | M.C. Kang;H.S. Tak;Y.K. Jeong;H.W. Lee;J.S. Kim .Properties and tool performance of ta-C films deposited by double-bend filteredcathodic vacuum arc for micro drilling applications[J].Diamond and Related Materials,2010(7/9):866-869. |
[51] | Robertson J. .Diamond-like amorphous carbon [Review][J].Materials Science & Engineering, R. Reports: A Review Journal,2002(4/6):129-281. |
[52] | 赵栋才,任妮,马占吉,肖更竭,武生虎.七种金属基底上类金刚石膜的过渡层制备研究[J].真空科学与技术学报,2008(04):346-350. |
[53] | UENG H Y;UO C T .Diamond-like Carbon Coatings on Microdrill Using an ECR-CVD system[J].Applied Surface Science,2005,249(1/2/3/4):246-251. |
[54] | Roger Jagdish Narayan .Pulsed laser deposition of functionally gradient diamondlike carbon-metal nanocomposites[J].Diamond and Related Materials,2005(8):1319-1330. |
[55] | Bonetti LF;Capote G;Santos LV;Corat EJ;Trava-Airoldi VJ .Adhesion studies of diamond-like carbon films deposited on Ti6Al4V substrate with a silicon interlayer[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1):375-379. |
[56] | V.N. Inkin;G.G. Kirpilenko;A.J. Kolpakov .Internal stresses in ta-C films deposited by pulse arc discharge method[J].Diamond and Related Materials,2001(3-7):1103-1108. |
[57] | POLIAKOV V P;SIQUEIRA C J DE M;VEIGA W et al.Physical and Tribologieal Properties of Hard Amorphous DLC Films Deposited on Different Substrates[J].Diamond and Related Materials,2004,13(4/5/6/7/8):1511-1515. |
[58] | Grimm, W.;Weihnacht, V. .Properties of super-hard carbon films deposited by pulsed arc process[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2010(4):506-509. |
[59] | Yaohui Wang;Xu Zhang;Xianying Wu;Huixing Zhang;Xiaoji Zhang .Superhard Nanocomposite Nc-tic/a-c:h Film Fabricated By Filtered Cathodic Vacuum Arc Technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2008(16):5085-5088. |
[60] | S.K. Mishra;L.C. Pathak .Deposition of crystalline C-N film by arc evaporation process[J].Materials Letters,2005(27):3481-3484. |
[61] | LEE KYUNG HWANG;TAKAI OSAMU .Nanomechanical Properties Through Nanoindentation Method of Amorphous Carbon and Carbon Nitride Films Synthesized hy Shielded Arc Ion Plating[J].Surface and Coatings Technology,2005,200(07):2428-2432. |
[62] | MD. Anisur Rahman;N. Soin;P. Maguire;R.A. D'Sa;S.S. Roy;C.M.O. Mahony;P. Lemoine;R. McCann;S.K. Mitra;J.A.D. McLaughlin .Structural and surface energy analysis of nitrogenated ta-C films[J].Thin Solid Films,2011(1):294-301. |
[63] | A. Bendavid;P. J. Martin;A. Jamting;H. Takikawa .Structural and optical properties of titanium oxide thin films deposited by filtered arc deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(0):6-11. |
[64] | A. Bendavid;P. J. Martin;H. Takikawa .Deposition and modification of titanium dioxide thin films by filtered arc deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(1/2):241-249. |
[65] | P. J. Martin;A. Bendavid;R. P. Netterfield;T. J. Kinder;F. Jahan;G. Smith .Plasma deposition of tribological and optical thin film materials with a filtered cathodic arc source[J].Surface & Coatings Technology,1999(1/3):257-260. |
[66] | Hirofumi Takikawa;Takaaki Matsui;Tateki Sakakibara;Avi Bendavid;Philip J. Martin .Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(1/2):145-151. |
[67] | MARTIN P J;NETTERFIELD R P;KINDER T J et al.Deposition of TiN,TiC,and TiO2 Films by Filtered Arc Evaporation[J].Surface and Coatings Technology,1991,49(1/2/3):239-243. |
[68] | Chang YY;Yang SJ;Wang DY .Structural and mechanical properties of Cr-C-O thin films synthesized by a cathodic-arc deposition process[J].Surface & Coatings Technology,2007(4/7):941-945. |
[69] | JOHNSON L J S;Rogstr(o)m L;JOHANSSON M P et al.Microstructure Evolution and Age Hardening in (Ti,Si) (C,N) Thin Films Deposited by Cathodic Arc Evaporation[J].Thin Solid Films,2010,519(04):1397-1403. |
[70] | Pi-Chuen Tsai;Wen-Jauh Chen;Jun-Hao Chen;Chi-Lung Chang .Deposition and characterization of TiBCN films by cathodic arc plasma evaporation[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(17):5044-5049. |
[71] | YanhuiZhao;Xueqi Wang;JinquanXiao;Baohai Yu;Fengqi Li .Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating[J].Applied Surface Science,2011(1):370-376. |
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