采用磁控溅射法制备NiCr-NiSi薄膜,以溅射功率、溅射时间、溅射气压及基片负偏压作为四因素进行正交试验,制备了9种性能不同的NiCr-NiSi薄膜热电偶测温刀头,对每片测温刀头上薄膜与刀体之间的附着力进行了测试,并对测试结果进行了极差分析.分析结果表明:在4个溅射因素当中,基片负偏压是影响薄膜附着力大小的最主要因素,在一定范围内,增大基片的负偏压值可提高薄膜的附着力.验证试验表明,NiCr薄膜溅射参数为溅射功率90 W、溅射时间30 min、溅射气压0.45 Pa、基片偏压-110 V,NiSi薄膜溅射参数为溅射功率100 W、溅射时间40 min、溅射气压0.4 Pa、基片偏压-110 V,可使NiCr和NiSi薄膜的附着力值分别约增大3.2N和1.5N.
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