在硼酸镀液中以单晶Si(111)为基底用双槽法制备Cu/Co多层膜,在镀液中分别加入了镀铜添加剂2000#和镀钴添加剂5#.探讨了镀层电结晶成核机理,在基础镀液中铜电结晶为三维连续成核过程,钴电结晶在较低电位下为三维连续成核,在较高电位下为三维瞬时成核过程.加入添加剂后,铜、钴电结晶均为三维瞬时成核过程.测试了Cu/Co多层膜的磁性能;添加剂能提高多层膜的磁性能,无添加剂的Cu/Co多层膜的巨磁阻(GMR)值约为5%,而在加入了添加剂后,其GMR值高达52%.
参考文献
| [1] | Itoh H;Hori T;Lnoue J et al.Electronic density of states at random interfaces and magnetoresistence in Co-Ni/Cu multilayers[J].Magnetism and Magnetic Materials,1994,136:33. |
| [2] | Baibich M N;Broto J M;Fert A .Giant magnetoresistance of (001)Fe/(001)Cr magnetic superlattices[J].Physical Review Letters,1996,61(21):2472-2475. |
| [3] | Min K I;Joo S K;Shin K H .Giant magnetoresistance of Co/Cu,NiFeCo/Cu,and NiFe/Cu multilayers sputter-deposited on Cu/Si (111) substrates[J].Magnetism and Magnetic Materials,1996,156(1-3):375-376. |
| [4] | H. El Fanity;K. Rahmouni;M. Bouanani;A. Dinia;G. Shmerber;C. Meny;P. Panissod;A. Cziraki;F. Cherkaoui;A. Berrad .Structural properties of electrodeposited Co/Cu multilayers[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):227-230. |
| [5] | 赵瑾,董大为,张卫国,姚素薇.铜/钴纳米多层膜的电化学制备及表征[J].电镀与涂饰,2002(05):1-3,48. |
| [6] | 刘冰,龚正烈,姚素薇,郭鹤桐,袁华堂,张允什.半导体硅上电沉积Cu/Co层状薄膜[J].物理化学学报,1999(04):356-360. |
| [7] | Scharifker B;Hills G .Theoretical and experimental studies of multiple nucleation[J].Electrochimica Acta,1983,28(07):879. |
| [8] | Gunawardena G;Hills G;Montenegro I et al.Electrochemic nucleation.part Ⅴ.Elctrodeposition of cadmium onto vitreous carbon and tin oxide electrodes[J].Electroanalytical Chemistry,1982,138:225. |
| [9] | Scharifker B R;Hills G .Theoretical and experimental studies of multiple nucleation[J].Electrochimica Acta,1982,28(07):879-889. |
| [10] | Oskam G J;Long J G;Natarajan A et al.Electrochemical deposition of metals onto silicon[J].Physics D:Applied Physics,1998,31:1927-1949. |
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