将非晶结构Fe-W合金浸泡在0.5 mol/L H2SO4溶液中,在电极表面形成WO3层,厚度约720 nm.通过化学法在半导体WO3上沉积金属Pd,扫描电镜和扫描隧道显微镜测试结果表明,沉积5 min后Pd的平均颗粒尺寸约为10 nm.在0.5 mol/L H2SO4溶液中的极化曲线测试结果表明,纳米Pd修饰WO3电极具有优异的电催化及光催化析氢活性,在500 W碘钨灯照射下,电流密度为6 A/dm2时电极的析氢过电位减小30 mV以上.
参考文献
[1] | Fujishima A;Honda K .Electrochemical photolysis of water at a semiconductor electrode[J].NATURE,1972,258(37):5358-5361. |
[2] | Aspnes D E;Heller A .Barrier height and leakage reduction in n-gas-platinum group metal schottky barriers upon exposure to hydrogen[J].Journal of Vacuum Science & Technology B:Microelectronics Processing and Phenomena,1983,1(03):602-607. |
[3] | Szklarczyk;Marek;Bockris et al.In situ STM studies of polycrystalline platinum electrodes[J].SURFACE SCIENCE,1991,241(1-2):54-60. |
[4] | 岳林海,徐铸德.半导体的表面修饰与其光电化学应用[J].化学通报,1998(09):28-31. |
[5] | Nakato Y;Hingami R;Nakamura Y et al.Modification of semiconductor surface with ultrafine metal particles for efficient photoelectrochemical reduction of carbon dioxide[J].Applied Sueface Science,1997,121:301-304. |
[6] | 魏庆玉 .三氧化钨蓝色氧钨生产[J].江西有色金属,1991,5(02):11-14. |
[7] | 陈祥君;邵丙铣 .WO3薄膜的制备与表征研究[J].薄膜的制备与表征研究,1993,6(02):103-136. |
[8] | 姚素薇.电沉积Fe-W非晶态合金的研究[J].材料保护,1992(05):4. |
[9] | 姚素薇;赵水林;郭鹤桐 等.Fe-W非晶镀层耐蚀机理的研究[J].中国腐蚀与防护学报,1993,13(04):350-356. |
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