欢迎登录材料期刊网

材料期刊网

高级检索

通过对硫代硫酸盐、丁二酰亚胺、碘化物、乙内酰脲、亚硫酸盐以及其它无氰镀银体系的分析,总结了当前无氰镀银工艺的技术特点及存在的问题,并阐述了无氰镀银技术的发展历程和研究现状.同时,基于国家目前的经济发展战略,对无氰镀银技术的前景予以了展望.

参考文献

[1] 宁远涛;赵怀志.银[M].长沙:中南大学出版社,2005:367,392.
[2] Elkington G;Elkington H .Coating,covering or plating certain metals[P].BP 8447,1840-03-25.
[3] 何建平.无氰电镀工艺的研究现状及解决问题的途径[J].电镀与涂饰,2005(07):42-45.
[4] Waste Management Research Center;Chicago Metal Finishers Institute .Non-cyanide silver as a substitute for cyanide processes[R].Chicago:Chicago Metal Finishers Institute,2002.
[5] 刘仁志.无氰镀银的工艺与技术现状[J].电镀与精饰,2006(01):21-24.
[6] 陈春成.无氰镀银技术概况及发展趋势[C].2003年全国电子电镀学术研讨会论文集,2003:118-119.
[7] Sascha Berger;Gerhard Hoffacker .Novel and Innovative Non-Cyanide Silver process: A report on Commercial Plating Experiences[J].Plating & Surface Finishing,2005(3):46-51.
[8] Alan Blair .Silver plating[J].Plating & Surface Finishing,1999(11):64-65.
[9] Culjkovic Josif .Cyanide free bath for electrodeposition of silver[P].US 3984292,1976-10-05.
[10] Leahy;Elizabeth P;Karustis et al.Non-cyanide acidic silver electroplating bath and additive therefore[P].US 4067784,1976-01-10.
[11] Jayakrishnan S;Natarajan S R;Vasu K L .Silver electrodeposition from thiosulfate solutions[J].Metal Finishing,1989,87(07):115-117.
[12] Nobel;Fred I;Brasch et al.Cyanide-free plating solutions for monovalent metals[P].US 5302278,1994-04-12.
[13] 魏立安.无氰镀银清洁生产技术[J].电镀与涂饰,2004(05):27-29,57.
[14] 苏永堂,成旦红,张炜,陈欢,徐伟一.无氰镀银添加剂的研究[J].电镀与环保,2005(02):11-13.
[15] 谷会军.无氰无汞镀银的工艺实践[J].材料保护,1997(09):35.
[16] 周永璋.硫代硫酸钠无氰镀银[J].电镀与环保,2004(01):15-16.
[17] 邹坚.硫代硫酸盐镀银槽发黑故障的排除[J].电镀与精饰,1995(03):30.
[18] 苏永堂,成旦红,李科军,曹铁华,徐伟一.脉冲无氰镀银及镀层抗变色性能的研究[J].电镀与涂饰,2005(01):1-5.
[19] 苏永堂,成旦红,李科军,曹铁华,徐伟一.硫代硫酸盐无氰脉冲镀银工艺研究[J].电镀与精饰,2005(02):14-18.
[20] 成旦红,苏永堂,李科军,曹铁华,张炜.双向脉冲无氰镀银工艺研究[J].材料保护,2005(07):21-24.
[21] 苏永堂,成旦红,张庆,王建泳,郭长春.银-纳米SiO2脉冲复合电镀工艺条件的优化与性能研究[J].电镀与涂饰,2005(10):5-7.
[22] 苏永堂;成旦红;张庆.银-纳米TiO2脉冲复合电沉积及耐蚀性的研究[A].上海:上海市电子学会电子电镀专委会,2005:282-287.
[23] Hradil E;Hradil H;Weisberg A M .Silver complex,method of making said complex and method and electrolyte containing said complex for electroplating silver and silver alloys[P].US 4126524,1978-11-21.
[24] Hradil E;Hradil H;Weisberg A M .Non-cyanide bright silver electroplating bath therefore,silver compounds and method of making silver compounds[P].US 4246077,1981-01-20.
[25] Sobha Jayakrishnan;S.R. Natarajan;K.I. Vasu .Alkaline Noncyanide Bath for Electrodeposition of Silver[J].Metal finishing,1996(5):12,14-15-0.
[26] Dini J W;Morrissey R J;Pacheco D R .Materials characterization of a non-cyanide silver electrodeposit[J].Plating and Surface Finishing,1997,84(12):62-67.
[27] S. Masaki;H. Inoue;H. Honma .Mirror-bright silver plating from a cyanide-free bath[J].Metal finishing,1998(1A):16-20.
[28] S. Masaki;H. Inoue;H. Honma .Dissolution behavior of silver anode in succinimide-silver complex bath[J].Metal finishing,1998(5):52-54.
[29] 蔡积庆.无氰镀Ag[J].航空工艺技术,1997(06):31-32.
[30] 周永璋,丁毅,陈步荣.丁二酰亚胺无氰镀银工艺[J].表面技术,2003(04):51-52.
[31] Kondo T;Masaki S;Yamakawa K .Silver plating from silver ethanesulfonate-potassium iodide bath[J].Metal Finishing,1991,89(10):32-36.
[32] 夏传义.贵金属电镀技术发展动态[C].贵金属电镀技术研讨会青年电镀工作者学术交流会论文集,1996:1~10.
[33] 安茂忠,张鹏,刘建一.碘化物镀液脉冲电镀Ag-Ni合金工艺[J].电镀与环保,2003(02):15-18.
[34] 白祯遐,黄锁让.无氰光亮镀银[J].电镀与环保,2001(01):21-23.
[35] Asakawa;Takanobu .Silver plating baths and silver plating method using the same[P].US 5601696,1997-02-21.
[36] Morrissey;Ronald J .Non-cyanide silver plating bath composition[P].US 20050183961,2005-08-25.
[37] 卢俊锋;安茂忠;代云飞.以内酰脲为配位剂的无氰电镀银工艺研究[J].电子电镀,2006(01):39-41.
[38] 刘奎仁;吕久吉;谢锋 .亚硫酸盐无氰镀银工艺[J].沈阳黄金学院学报,1997,16(04):258-263.
[39] 王兵;郭鹤桐;于海燕.甲基磺酸盐电镀银镀层工艺的研究[A].深圳:中国电子学会电镀专业委员会,2001:91-93.
[40] 蔡积庆.Sn-Ag合金无氰电镀液[J].航空制造技术,2002(03):68-70.
[41] 蔡积庆.电镀银和银合金[J].电镀与环保,2002(03):8-10.
[42] Herklotz;Gunter;Frey et al.Electroplating bath for the electrodeposition of silver-tin alloys[P].US 5514261,1996-05-07.
[43] 杨勇彪,张正富,陈庆华,徐明丽,马全宝.铜基无氰镀银的研究[J].云南冶金,2004(04):20-22,31.
[44] Balmasov A V;Sonin A V;Krivtsov A K et al.Pulsed deposition of silver from polyligand electrolytes[J].Protection of Metals,2005,41(05):422-426.
[45] Hoffacker;Gerhard .Bath system for galvanic deposition of metals[P].US 6620304,2000-02-22.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%