比较并评价了以甲醛和以次磷酸钠为还原剂的化学镀铜工艺.结果表明,次磷酸钠镀铜液的稳定性高于甲醛镀铜液,次磷酸钠镀液的沉积速率高于甲醛镀液.以甲醛为还原剂的镀层晶粒细小,而以次磷酸钠为还原剂的镀层呈团粒状.甲醛镀铜层铜的质量分数接近100%,次磷酸钠镀铜层中铜的质量分数为93.9%,镍的质量分数为6.1%,镀层为铜-镍合金.以甲醛为还原剂的化学镀铜层的电导率、抗拉强度、延伸率等物理性能均优于次磷酸钠化学镀铜层.
参考文献
[1] | 田庆华,闫剑锋,郭学益.化学镀铜的应用与发展概况[J].电镀与涂饰,2007(04):38-41. |
[2] | Masahiro Oita;Masao Matsuoka;Chiaki Iwakura .Deposition rate and morphology of electroless copper film from solutions containing 2,2'-dipyridy[J].Electrochimica Acta,1997,42(09):1435-1440. |
[3] | Honma H;Kobayashi T .Electroless copper deposition process using glyoxylicacid as a reducing agent[J].Journal of the Electrochemical Society,1994,141(03):730-733. |
[4] | Yosi Y. Shacham-Diamand .Electroless Copper Deposition Using Glyoxylic Acid as Reducing Agent for Ultralarge Scale Integration Metallization[J].Electrochemical and solid-state letters,2000(6):279-282. |
[5] | R. TOUIR;H. LARHZIL;M. EBNTOUHAMI .Electroless deposition of copper in acidic solutions using hypophosphite reducing agent[J].Journal of Applied Electrochemistry,2006(1):69-75. |
[6] | Jun Li;Paul A. Kohl .The Acceleration of Nonformaldehyde Electroless Copper Plating[J].Journal of the Electrochemical Society,2002(12):C631-C636. |
[7] | Jun Li;Paul A. Kohl .The Deposition Characteristics of Accelerated Nonformaldehyde Electroless Copper Plating[J].Journal of the Electrochemical Society,2003(8):C558-C562. |
[8] | Cheng D H;Xu W Y;Zhang Z Y et al.Electroless copper plating using hypophosphite as reducing agent[J].Metal Finishing,1997,95(01):34-37. |
[9] | Hung A;Chen K M .Mechanism of hypophosphite-reduced electroless copper plating[J].Journal of the Electrochemical Society,1989,136(01):72-75. |
[10] | Chang Hwa Lee;Jae Jeong Kim .Effects of Pd activation on the self annealing of electroless copper deposition using Co(Ⅱ)-ethylenediamine as a reducing agent[J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,2005(2):475-479. |
[11] | Michinari Sone;Koichi Kobayakawa;Makoto Saitou;Yuichi Sato .Electroless copper plating using Fe{sup}(II) as a reducing agent[J].Electrochimica Acta,2004(2):233-238. |
[12] | Takayuki Homma;Amiko Tamaki;Hiromi Nakai;Tetsuya Osaka .Molecular orbital study on the reaction process of dimethylamine borane as a reductant for electroless deposition[J].Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry,2003(0):131-136. |
[13] | 杨防祖,杨斌,陆彬彬,黄令,许书楷,周绍民.以次磷酸钠为还原剂化学镀铜的电化学研究[J].物理化学学报,2006(11):1317-1320. |
[14] | 杨防祖,吴丽琼,黄令,郑雪清,周绍民.以次磷酸钠为还原剂的化学镀铜[J].电镀与精饰,2004(04):7-9,24. |
[15] | 杨防祖,杨斌,黄剑廷,吴丽琼,黄令,周绍民.次磷酸钠化学镀铜镍合金的研究[J].电镀与涂饰,2006(07):1-3,14. |
[16] | Xueping Gan;Yating Wu;Lei Liu .Effects of K_4Fe(CN)_6 on electroless copper plating using hypophosphite as reducing agent[J].Journal of Applied Electrochemistry,2007(8):899-904. |
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