采用电沉积法在铂基体上制备出电活性铁氰化铜钴复合膜.在0.1mol/LKNO3溶液中采用循环伏安法并结合电化学石英晶体微天平技术考察了复合膜的电化学行为以及循环寿命.并在0.1mol/L(KNO3+CsNO3)溶液中测定不同混合浓度下复合薄膜的伏安曲线,分析了薄膜对Cs+和K+的选择性.实验表明:铁氰化铜钴复合膜是一种取代型杂化铁氰化物,非单一膜的简单组合.具有良好的离子交换特性及选择性,且循环寿命好于单膜,具备电化学控制离子分离膜的初步特征.
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