为改善Ni-5％W合金基带表面质量,以磷酸-硫酸和添加剂为电解液,采用均匀实验设计方法进行电解抛光,利用原子力显微镜对样品表面形貌进行表征,并用DPS(Data Process System)软件对抛光结果进行逐步回归优化.结果表明,在室温下,采用磷酸(85％)、硫酸(98％)和有机添加剂,以体积比为4:3:3的抛光液抛光效果较好,抛光后基带表面均方根粗糙度在25μm×25 μm范围内可降低到5 nm以下.
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