采用电沉积的方法获得了高硬度铜镀层,考察了镀层的形貌、硬度以及热振性能,并对其进行了晶相分析与晶粒尺寸计算.结果表明,由于镀层中晶粒尺寸减少,晶粒排列更加紧密,导致镀层硬度大大提高.这种高硬度、低热阻的特性很好的解决了LED散热的问题,延长了LED灯的使用寿命.
参考文献
[1] | 方亮,钟前刚,何建,刘高斌,李艳炯,郭培.大功率LED封装用散热铝基板的制备与性能研究[J].材料导报,2011(02):130-134. |
[2] | 杨克涛,傅仁利.铝基板阳极氧化成膜温度与膜层结构[J].电子元件与材料,2005(09):52-54. |
[3] | 李华平,柴广跃,彭文达,牛憨笨.大功率LED的封装及其散热基板研究[J].半导体光电,2007(01):47-50. |
[4] | Ishikawa H;Zhao G Y;Nakada N .GaN on Si substrate with AlGaN/AlN intermediate layer[J].Applied Physics.Part 2,1999,38(5A):L492-494. |
[5] | Chuong Anh Tran;Chen-Fu Chu;Chao-Chen Cheng;Wen-Huan Liu;Jiunn-Yi Chu;Hao-Chun Cheng;Feng-Hsu Fan;Jui-Kang Yen;Trung Doan .High brightness GaN vertical light emitting diodes on metal alloyed substrate for general lighting application[J].Journal of Crystal Growth,2007(0):722-724. |
[6] | 李华平,柴广跃,彭文达,牛憨笨.大功率LED的封装及其散热基板研究[J].半导体光电,2007(01):47-50. |
[7] | 殷录桥,李清华,张建华.提高大功率LED散热和出光封装材料的研究[J].半导体技术,2008(04):281-285. |
[8] | X. Guo;Y.-L. Li;E. F. Schubert .Efficiency of GaN/InGaN light-emitting diodes with interdigitated mesa geometry[J].Applied physics letters,2001(13):1936-1938. |
[9] | Seong-Ran Jeon;Young-Ho Song;Ho-Jin Jang;Gye Mo Yang;Soon Won Hwang;Sung Jin Son .Lateral current spreading in GaN-based light-emitting diodes utilizing tunnel contact junctions[J].Applied physics letters,2001(21):3265-3267. |
[10] | Barbosa LL;de Almeida MRH;Carlos RM;Yonashiro M;Oliveira GM;Carlos IA .Study and development of an alkaline bath for copper deposition containing sorbitol as complexing agent and morphological characterization of the copper film[J].Surface & Coatings Technology,2005(2/3):145-153. |
[11] | 余德超,谈定生.电镀铜技术在电子材料中的应用[J].电镀与涂饰,2007(02):43-47. |
[12] | Sunjung K;Jun-Ho J;Jeong-Soo L et al.Stress behavior of electrodepesited copper films as mechanical supporters for light emitting diodes[J].Electrochimica Acta,2007,52:5258-5265. |
[13] | Fonseca A;Raimundo IM .A multichannel photometer based on an array of light emitting diodes for use in multivariate calibration[J].Analytica chimica acta,2004(2):223-229. |
[14] | El Rehim SSA.;El Deeb MM.;Sayyah SM. .Electroplating of copper films on steel substrates from acidic gluconate baths[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2000(4):249-254. |
[15] | Kongstein O E;Bertocci U;Stafford G R .In situ stress measurements during copper electrodepesition on (111)-textured Au[J].Journal of the Electrochemical Society,2005,152:C116-C123. |
[16] | GU Xiao-qing,徐赛生.不同浓度添加剂对铜镀层性能的影响[J].中国集成电路,2008(08):61-64. |
[17] | 沈金文,吕广庶,马壮,王全胜.在热震试验中热障涂层的裂纹形成和扩展[J].新技术新工艺,2002(04):39-41. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%