研究了用氩离子束辅助沉积(IBAD)技术制备的铁/锆多层膜中的微结构演化规律.实验中所使用的氩离子能量范围为4keV到12keV,束流密度为12 μA/cm2.实验结果表明,用IBAD技术可在富锆端制备出完全非晶化的薄膜.对于Fe(0.54nm)/Zr(4.5nm)多层膜,随Ar离子能量的增加,在薄膜中还观察到晶态-非晶-亚稳fcc相-非晶-晶态的结构转变.对于富铁合金膜,IBAD技术仅能制备部分非晶化的薄膜.
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