合成了光敏性有机硅树脂PSUA,采用超声分散法将纳米SiO2分散在光敏性有机硅体系中,通过紫外光固化方式制备了光固化有机硅杂化材料.研究了纳米SiO2含量对杂化体系稳定性和光固化速率的影响,测定了光固化膜硬度,用扫描电镜观察了光固化膜断面形貌.实验结果表明,表面改性的纳米SiO2在杂化体系中分散比较均匀,稳定性好,能够有效增强光固化膜的硬度,但降低了光固化速率,杂化体系中纳米SiO2的用量以3%～5%为宜.
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