利用射频反应磁控溅射法在45钢基体上制备了氧化铬薄膜.采用XRD测试了薄膜的晶体结构,用Tribo-Indentor纳米力学测试系统得到了薄膜的硬度及微观形貌,在UMT显微力学测试仪上测试了薄膜的耐磨损性能,在此基础上讨论了铬靶溅射功率对薄膜的力学性能和耐磨损性能的影响.结果表明:在射频功率较低的情况下薄膜为Cr2O3结构.随着射频功率的提高,薄膜表面的大颗粒物质增多,硬度下降.射频功率增大时,磨损体积增加,薄膜的耐磨损性能下降.
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