采用新型中频磁控溅射技术及多弧离子镀相结合的复合镀膜工艺,在硬质合金YT14基体上制备了MoS2 /Zr复合薄膜.采用扫描电子显微镜(SEM)考察MoS2 /Zr复合薄膜表面及截面的形貌,利用能谱分析(EDX)薄膜的成分组成.测试涂层的厚度、显微硬度及涂层与基体之间的结合力等性能参数.结果表明:制备的MoS2 /Zr复合薄膜结构致密,结合力约为60N,厚度约为2.6μm,硬度约为HV800.
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