氢氧化钾溶液腐蚀硅尖具有易于实现、设备简单、优异的纵向腐蚀均匀性等优点,但腐蚀均匀性差、纵向和横向腐蚀速率之比低、针形为不对称的八棱锥.通过在KOH溶液中添加过饱和的碘单质(I2),显著减小了快腐蚀面的削角速率,在较小的掩膜下腐蚀出高的硅尖.更为重要的是该腐蚀液腐蚀的硅尖异于常规的不对称八棱锥,而是一种半锥角很小的"火箭尖"形状,因此可望获得更好的扫描特性和隧道效应.
参考文献
| [1] | WOLTER O;BAYER T H;GRESCHNER J .Micromachined silicon sensors for scanning force microscopy[J].Journal of Vacuum Science and Technology,1991,B9(02):1353-1357. |
| [2] | ALBRECHT TR;AKAMINE S;CARVERARVER TE et al.Microfabrication of cantilever styli for the atomic force microscope[J].Journal of Vacuum Science and Technology A,1990,A8(04):3386-3396. |
| [3] | D.P. Burt;P.S. Dobson;L. Donaldson;J.M.R. Weaver .A simple method for high yield fabrication of sharp silicon tips[J].Microelectronic engineering,2008(3):625-630. |
| [4] | HAN JIANQIANG;LI XINXIN;BAO HAIFEI et al.Silicon tips fabricated with masked maskless combined anisotropic etching and p+ surplane doping[J].Journal of Micromechanics and Microengineering,2006,16:198-204. |
| [5] | M.A.R. Alves;D.F. Takeuti;E.S. Braga .Fabrication of sharp silicon tips employing anisotropic wet etching and reactive ion etching[J].Microelectronics journal,2005(1):51-54. |
| [6] | 卢少勇,韩建强,李青,王疆英,陈志强.含添加剂的各向异性腐蚀液中实现小掩膜下高硅尖的腐蚀[J].电子器件,2008(05):1550-1552,1558. |
| [7] | Trieu HK.;Mokwa W. .A generalized model describing corner undercutting by the experimental analysis of TMAH/IPA[J].Journal of Micromechanics and Microengineering,1998(2):80-83. |
| [8] | Powell O.;Harrison HB. .Anisotropic etching of {100} and {110} planes in (100) silicon[J].Journal of Micromechanics and Microengineering,2001(3):217-220. |
| [9] | Campbell SA.;Dixon L.;Earwaker R.;Port SN.;Schiffrin DJ.;Cooper K. .INHIBITION OF PYRAMID FORMATION IN THE ETCHING OF SI P[100] IN AQUEOUS POTASSIUM HYDROXIDE-ISOPROPANOL[J].Journal of Micromechanics and Microengineering,1995(3):209-218. |
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