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介绍了一种制备具有低介电常数氧化硅分子筛薄膜的新方法.以正硅酸乙酯为硅源,四丙基氢氧化铵(TPAOH)为模板剂和碱源,采取水热晶化技术,通过原位法在硅晶片表面制备出纯二氧化硅透明分子筛薄膜;采用紫外光解法脱除分子筛薄膜孔道内的模板剂,制备出具有低介电性能的氧化硅分子筛薄膜.使用FT-IR,XRD和SEM对样品进行了结构表征,并采用阻抗分析仪测量了薄膜的介电常数,采用纳米硬度计测量薄膜的弹性模量和硬度.

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